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Photomask and next-generation lithography mask technology XVII (13-15 April 2010, Yokohama, Japan)Hosono, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, various pagings, isbn 0-8194-8238-2 978-0-8194-8238-9Conference Proceedings
